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TRENCH 数据表, PDF

搜索关键字 : 'TRENCH' - 的资料共: 42 (1/3) Pages
制造商部件名数据表功能描述
Company Logo Img
Stanson Technology
STC6332 Datasheet pdf image
421Kb/9P
The STC6332 is the N & P-Channel enhancement mode power field effect transistor using high cell density DMOS trench technology.
ST2318SRG Datasheet pdf image
221Kb/7P
ST2318SRG is the N-Channel logic enhancement mode power field effect transistor is produced using high cell density, DMOS trench technology.
STP4403 Datasheet pdf image
321Kb/6P
STP4403 is the P-Channel logic enhancement mode power field effect transistors are produced using high cell density, DMOS trench technology.
ST2319SRG Datasheet pdf image
229Kb/8P
ST2319SRG is the P-Channel logic enhancement mode power field effect transistor is produced using high cell density, DMOS trench technology.
STP9434 Datasheet pdf image
314Kb/6P
STP9434 is the P-Channel logic enhancement mode power field effect transistors are produced using high cell density, DMOS trench technology.
STP9235 Datasheet pdf image
331Kb/6P
STP9235 is the P-Channel logic enhancement mode power field effect transistors are produced using high cell density, DMOS trench technology.
STP9527 Datasheet pdf image
927Kb/7P
STP9527 is the P-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
ST2315SRG Datasheet pdf image
218Kb/6P
ST2315SRG is the P-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STP7401 Datasheet pdf image
461Kb/6P
STP7401 is the P-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
ST3401SRG Datasheet pdf image
212Kb/6P
ST3401RSG is the P-Channel logic enhancement mode power field effect transistor which is produced using high cell density DMOS trench technology.
ST3406SRG Datasheet pdf image
325Kb/6P
ST3406SRG is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STP9437 Datasheet pdf image
375Kb/6P
STP9437 is the P-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
ST3422A Datasheet pdf image
338Kb/6P
The ST3422A is the N-Channel logic enhancement mode power field effect transistor is produced using high cell density, DMOS trench technology.
STN4346 Datasheet pdf image
352Kb/7P
STN4392 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STN4426 Datasheet pdf image
362Kb/6P
STN4426 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STP6308 Datasheet pdf image
420Kb/6P
STP6308 is the dual P-Channel enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STN4392 Datasheet pdf image
383Kb/7P
STN4392 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STN4480 Datasheet pdf image
742Kb/6P
STN4480 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STN4850 Datasheet pdf image
532Kb/6P
STN4850 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.
STN1810 Datasheet pdf image
966Kb/7P
STN1810 is the N-Channel logic enhancement mode power field effect transistor which is produced using high cell density, DMOS trench technology.

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什么是 TRENCH


“ Trench”是电子组件制造技术之一,用于制造半导体设备的过程。

Trench技术是一项技术,旨在改善半导体设备的电性能。

Trench技术重新设计了半导体设备的结构,以改善设备的热量产生和性能降解。

使用沟槽技术,可以在半导体设备内挖出一个小坑(沟槽),以增加设备的表面积。

这改善了电气性能,因为电流流的路径较短。

Trench技术主要用于高性能半导体设备,例如MOSFET(金属氧化物半导体场效应晶体管)。

这些半导体设备用于高速电子电路,电源转换设备和汽车控制设备。

Trench技术在现代电子组件行业中起着非常重要的作用,因为它提高了设备​​的性能和效率。

*此信息仅供一般参考,对于因上述信息造成的任何损失或损害,我们概不负责。


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